ICP-AES Spectrometer 4820/4850

The ICP-AES Spectrometer 4820/4850 offers accurate metal analysis with a programmable spark source and efficient optical system. Perfect for metallurgy and foundry industries, it provides stable results with real-time drift correction, minimal maintenance, and user-friendly one-button operation.

Modles : 4820、4850

Quantity:

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Metals Analyzer, which creatively combined with world leading argon circulation technology, enables the analysis of Fe, Al, Cu and other bases materials. It is an ideal solution for fast and accurate quantitative analysis near the furnace, in metal material quality control industries and scientific research fields. It is widely used in industries including metallurgy, foundry, metal processing, metal materials quality identification, application of new alloys and etc.

Features:

Smart and reliable digital source

Programmable digitalized spark source, suitable for different bases, improving the analysis accuracy

Spark Stand

Open spark stand with smaller internal space reduces the gas consumption Four-way argon flushing design effectively removes residual dust, less maintenance

Advanced and stable optical system

Paschen-Runge optical system with full wavelength coverage. Multi-CCD detectors with high resolution Real-time monitoring and constant temperature guarantee the stability of the optical system

Customized sample clamp

Customized sample clamp adapted to different sample geometries

Original real-time intelligent drift correction technology

Real-time spectrum drift correction, enhances the stability of instrument Reducing frequency of standardization Automatic calibration, easier operation

One-button operation

One-button operation for quick and easy handling, facilitating factory requirement

Specifications :

	EXPEC 4820		EXPEC 4850
Optical System	Paschen-Runge optical system using multiple high-performance CMOS detectors
	Optical chamber with argon self-purification system		Dual chamber argon purging optical system
	Wavelength Range: 174~520 nm		Wavelength Range：140~680nm
Source	Programmable full digital pulse source
	High energy pre-ignition technology, ignition pulse: 1~14Kv
	Maximum discharge frequency: 1000Hz, Maximum discharge current: 400A
	Spark excitation pulse: 20~230V, Arc excitation pulse: 20~60 V
Power supply and environmental requirements	Power supply voltage: (220 ± 20) V AC, (50 ± 1) Hz, single power supply with protective grounding
	Maximum excitation frequency: 400W, Average standby power: 50W
	Working temperature: 10~30 ℃, Storage temperature: 0~45 ℃, Working humidity: 20~80% RH
Spark Stand	Opened sample operation platform, which can be equipped with various sample adapters for special applications to meet different small sample analysis needs
	Optimized argon flushing design, better argon saving and spark stability
	Easy to clean and maintain, intelligent reminder of maintenance cycle
Argon	Aperture of spark stand: 13mm (optional: 6mm)
	Purity: 99.999%, Pressure: 0.5MPa
	Burning flow is about 3.5L/min, maintaining and standby flow is about 0.1L/min		Burning flow is about 3.5L/min, maintaining and standby flow is about 0.2L/min
Dimensions and weight	Length: 818mm, width: 590, height: 396mm weight: about 70Kg		Length: 623mm, width: 735mm, height: 443mm weight: about 80Kg
EMC	IEC 610004-2, 61000-4-4, 61000-4-5
Model	F	None	Dual optical chamber configuration, best UV analysis capability, capable of accurately analyzing N elements, meeting high-end analysis requirements for various matrixes such as Fe, Al, Cu, Zn, Ni, Ti, Mg, Co, etc.
	N	Suitable for all matrix analysis and can meet the matrix analysis requirements such as Fe,Al,Cu, Ni,and Zn	Dual optical chamber configuration, strong UV analysis capability, meeting various matrix analysis requirements for Fe, Al, Cu, Zn, Ni, Ti, Mg,Co, etc.
	S	Suitable for nonferrous metal analysis and meet the matrix analysis requirements such as Al,Cu, Zn, and Mg	Single optical chamber configuration to meet matrix analysis requirements for Al, Cu, Zn, Mg,etc.

	EXPEC 4820		EXPEC 4850
Optical System	Paschen-Runge optical system using multiple high-performance CMOS detectors
	Optical chamber with argon self-purification system		Dual chamber argon purging optical system
	Wavelength Range: 174~520 nm		Wavelength Range：140~680nm
Source	Programmable full digital pulse source
	High energy pre-ignition technology, ignition pulse: 1~14Kv
	Maximum discharge frequency: 1000Hz, Maximum discharge current: 400A
	Spark excitation pulse: 20~230V, Arc excitation pulse: 20~60 V
Power supply and environmental requirements	Power supply voltage: (220 ± 20) V AC, (50 ± 1) Hz, single power supply with protective grounding
	Maximum excitation frequency: 400W, Average standby power: 50W
	Working temperature: 10~30 ℃, Storage temperature: 0~45 ℃, Working humidity: 20~80% RH
Spark Stand	Opened sample operation platform, which can be equipped with various sample adapters for special applications to meet different small sample analysis needs
	Optimized argon flushing design, better argon saving and spark stability
	Easy to clean and maintain, intelligent reminder of maintenance cycle
Argon	Aperture of spark stand: 13mm (optional: 6mm)
	Purity: 99.999%, Pressure: 0.5MPa
	Burning flow is about 3.5L/min, maintaining and standby flow is about 0.1L/min		Burning flow is about 3.5L/min, maintaining and standby flow is about 0.2L/min
Dimensions and weight	Length: 818mm, width: 590, height: 396mm weight: about 70Kg		Length: 623mm, width: 735mm, height: 443mm weight: about 80Kg
EMC	IEC 610004-2, 61000-4-4, 61000-4-5
Model	F	None	Dual optical chamber configuration, best UV analysis capability, capable of accurately analyzing N elements, meeting high-end analysis requirements for various matrixes such as Fe, Al, Cu, Zn, Ni, Ti, Mg, Co, etc.
	N	Suitable for all matrix analysis and can meet the matrix analysis requirements such as Fe,Al,Cu, Ni,and Zn	Dual optical chamber configuration, strong UV analysis capability, meeting various matrix analysis requirements for Fe, Al, Cu, Zn, Ni, Ti, Mg,Co, etc.
	S	Suitable for nonferrous metal analysis and meet the matrix analysis requirements such as Al,Cu, Zn, and Mg	Single optical chamber configuration to meet matrix analysis requirements for Al, Cu, Zn, Mg,etc.