AELAB | Water Testing Equipment | Ultrapure water system
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An Ultrapure Water System provides the highest level of water purity required for advanced laboratory and industrial applications. By eliminating ions, particulates, organics, bacteria, and gases, these systems deliver water that meets strict ASTM, ISO, and USP standards. In environments like pharmaceuticals, semiconductors, and life sciences, even trace contaminants can compromise results—making ultrapure water an essential resource for precision and compliance.
An Ultrapure Water System is an advanced purification system engineered to produce Type I water—free from ions, particles, bacteria, organic molecules, and dissolved gases. It achieves resistivity up to 18.2 MΩ·cm and TOC levels below 5 ppb, making it suitable for the most demanding analytical and manufacturing processes. Common applications include high-performance liquid chromatography (HPLC), PCR assays, semiconductor wafer cleaning, and pharmaceutical formulation.
| Feature | Details |
|---|---|
| Water Type | Type I Ultrapure Water (ASTM, ISO, USP compliant) |
| Resistivity | ≥ 18.2 MΩ·cm at 25 °C |
| Total Organic Carbon (TOC) | ≤ 5 ppb (ultralow organic contamination) |
| Bacterial Count | < 1 CFU/mL; endotoxin < 0.03 EU/mL (bio-grade) |
| Purification Stages | Pretreatment, RO, DI, UV oxidation, UF, final polishing |
| Monitoring | Real-time TOC and resistivity with digital display |
| Output Flow Rate | 1–20 L/min (lab); up to 10,000 L/h (industrial) |
| Compliance | ASTM D1193, ISO 3696, USP <643>, EP 2.2.13 |
| Parameter | Ultrapure Water (Type I) | Pure Water (Type II) | RO Water |
|---|---|---|---|
| Resistivity | ≥ 18.2 MΩ·cm | 1–10 MΩ·cm | 0.05–1 MΩ·cm |
| TOC | ≤ 5 ppb | ≤ 50 ppb | ≤ 500 ppb |
| Microbial Content | Extremely low (< 1 CFU/mL) | Low | Moderate |
| Typical Use | HPLC, PCR, semiconductor fabrication | General laboratory work | Pre-treatment for further purification |
Q: What purity level defines ultrapure water?
A: Ultrapure water (Type I) has resistivity ≥ 18.2 MΩ·cm, TOC ≤ 5 ppb, and microbial count < 1 CFU/mL, meeting ASTM and USP standards.
Q: How is ultrapure water different from deionized water?
A: Deionized water removes ions but may still contain organics and microbes. Ultrapure water goes further, eliminating all contaminants through RO, UV, UF, and polishing stages.
Q: Which applications require ultrapure water?
A: Ultrapure water is used in HPLC, PCR, cell culture, semiconductor fabrication, and pharmaceutical manufacturing, where even ppb-level contaminants can interfere with results.
Q: How often should maintenance be performed?
A: Routine maintenance—such as cartridge replacement and sanitization—should follow manufacturer guidelines, typically every 3–12 months depending on system usage and water quality.
Q: What standards govern ultrapure water quality?
A: Common standards include ASTM D1193, ISO 3696, USP <643>, and EP 2.2.13, which define resistivity, TOC, microbial, and particulate limits for laboratory-grade water.
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